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吴自勤, 刘洪图. 尺寸缩小带来的巨大挑战[J]. 物理, 2002, 31(01).
引用本文: 吴自勤, 刘洪图. 尺寸缩小带来的巨大挑战[J]. 物理, 2002, 31(01).
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Some issues of the material physics for ultra large scale integration(part Ⅱ) giant challenges for the scaled ulsi[J]. PHYSICS, 2002, 31(01).
Citation: Some issues of the material physics for ultra large scale integration(part Ⅱ) giant challenges for the scaled ulsi[J]. PHYSICS, 2002, 31(01).
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尺寸缩小带来的巨大挑战

Some issues of the material physics for ultra large scale integration(part Ⅱ) giant challenges for the scaled ulsi

    摘要
  • 摘要: 随着CMOS技术缩至100nm或更小，在CMOS器件结构、接触电阻以及大直径硅晶片等方面均遇到一些材料物理的巨大挑战.

     

    Abstract: We discuss the giant challenges that material physics faces regarding the structure of CMOS devices, contact resistance, and large diameter silicon wafers when CMOS technology reaches below 100nm.

     

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